Thermal oxidation process on Si(113)-(3 × 2) investigated using high-temperature scanning tunneling microscopy

• Hiroya Tanaka,
• Shinya Ohno,
• Kazushi Miki and
• Masatoshi Tanaka

Beilstein J. Nanotechnol. 2022, 13, 172–181, doi:10.3762/bjnano.13.12

• the literature. Initial oxidation processes were identified based on high-resolution STM images. Keywords: high-index Si surface; in situ measurement; oxidation; scanning tunneling microscopy (STM); Introduction High-index silicon surfaces have drawn considerable interest for their usefulness in